- ion-beam damage
- дефект, викликаний іонним опромінюванням
English-Ukrainian dictionary of microelectronics. 2013.
ion-beam damage
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Ion beam analysis — ( IBA ) is an important family of modern analytical techniques involving the use of MeV ion beams to probe the composition and obtain elemental depth profiles in the near surface layer of solids. All IBA methods are highly sensitive and allow the … Wikipedia
Focused ion beam — Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor and materials science fields for site specific analysis, deposition, and ablation of materials. The FIB is a scientific instrument that resembles a… … Wikipedia
Gas cluster ion beam — Gas Cluster Ion Beams (GCIB) is a new technology for nano scale modification of surfaces. It can smooth a wide variety of surface material types to within an angstrom of roughness without subsurface damage. It is also used to chemically alter… … Wikipedia
Ion implantation — is a materials engineering process by which ions of a material can be implanted into another solid, thereby changing the physical properties of the solid. Ion implantation is used in semiconductor device fabrication and in metal finishing, as… … Wikipedia
Ion cannon — In science fiction an ion cannon is a beam weapon that fires beams of ions (particles, i.e. atoms that have been affected in some way as to cause them to gain an electrical charge). Due to its power it is usually classified as a superweapon. An… … Wikipedia
Electron beam induced deposition — (EBID) is a process of decomposing gaseous molecules by electron beam leading to deposition of non volatile fragments onto a nearby substrate. Process Focused electron beam of scanning electron microscope (SEM) or scanning transmission electron… … Wikipedia
Static secondary ion mass spectrometry — Static secondary ion mass spectrometry, or static SIMS is a technique for chemical analysis including elemental composition and chemical structure of the uppermost atomic or molecular layer of a solid which may be a metal, semiconductor or… … Wikipedia
Plasma-immersion ion implantation — (PIII) [cite book | title = Materials Science of Thin Films | author = Milton Ohring | publisher = Academic Press | year = 2002 | isbn = 0125249756 | url = http://books.google.com/books?id=SOt yFjV xwC pg=PA267… … Wikipedia
Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… … Wikipedia
Scanning Helium Ion Microscope — A Scanning Helium Ion Microscope (SHIM) is a new imaging technology based on a scanning helium ion beam. [ [http://nanotechwire.com/news.asp?nid=2120 ntid=121 pg=1 Nanotechwire press release announcing new microscope, retrieved December 13, 2006] … Wikipedia
Particle beam — A particle beam is an accelerated stream of charged particles or neutrons (often moving at very near the speed of light) which may be directed by magnets and focused by electrostatic lenses, although they may also be self focusing (see… … Wikipedia
